PVD DLC (a-C) Thin Film, 1um

Ionquest is pioneering the next generation of thin film technology with our turnkey PHDP (Pulsed High-Density Plasma) magnetron source—an integrated system combining a proprietary pulsed plasma generator with an enhanced magnetron design.

Engineered to be application-driven, market-specific, and retrofittable, this technology delivers significant advancements over traditional HiPIMS/HPPMS pulsed DC systems. It offers superior plasma discharge stability, higher deposition rates, and dramatically improved film quality.

Purpose-built for rate, scalability, and performance, Ionquest’s patented PHDP-magnetron deposition source redefines what’s possible in thin film manufacturing. It provides a true industrial alternative to arc deposition by enabling high ionization and high deposition rates—without reactive gas control—producing dense, hard, smooth films free of macro-particles.

For semiconductor applications, it enables low-stress, dense films with the industry’s most stable pulsed high-density plasma discharge.

Ionquest is the first company worldwide to deliver a complete, commercial-ready PHDP-magnetron source solution, opening new frontiers in thin film materials across markets including Semiconductor, Automotive, Smart Devices, Military, Cutting Tools, Medical Coatings, Decorative Coatings, and PVD Chrome Plating.